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Ellipsometry of passive oxide films on nickel in acidic sulfate solution

机译:酸性硫酸盐溶液中镍上无源氧化膜的椭偏

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摘要

Nickel passive film has been studied in acidic sulfate solutions at pH 2.3 and 3.3 by ellipsometry. During anodic passivation followed by cathodic reduction, the roughness increases with dissolution of nickel, being indicated by gradual decrease of reflectance. However, the ellipsometric parameters, Ψ (arctan of relative amplitude ratio) and Δ (relative retardation of phase), are relatively insensitive to the roughness increase. From the change of Ψ and Δ, δΨ and δΔ, during the anodic passivation and reduction, thickness of the passive oxide film was estimated with assumption of refractive index of nf = 2.3 of the film. The thickness estimated is a range between 1.4 and 1.7 nm in the passive potential region from 0.8 to 1.4 V vs. RHE, having a tendency of thickening with increase of potential. Cathodic reduction at constant potential induces a change of the oxide film to an oxide film with lower refractive index of nf = 1.7, accompanied by thickening of the film about 30% more in the initial stage of reduction for 30 s. The gradual decrease of thickness takes place for the oxide with the lower refractive index in the latter stage. The potential change from the passive region to cathodic hydrogen evolution region may initially cause hydration of the passive oxide of NiO, i.e., NiO + H2O = Ni(OH)2, and during the latter stage of reduction, the hydrated nickel oxide gradually dissolves.
机译:镍钝化膜已通过椭偏法在pH为2.3和3.3的酸性硫酸盐溶液中进行了研究。在阳极钝化和阴极还原过程中,粗糙度随镍的溶解而增加,这由反射率的逐渐降低表示。但是,椭偏参数parameters(相对振幅比的弧度)和Δ(相对相位延迟)对粗糙度增加相对不敏感。根据Ψ和Δ的变化,δΨ和δΔ的变化,在阳极钝化和还原过程中,假定nf = 2.3,可以估算钝化氧化膜的厚度。相对于RHE,在被动电位区域中,估计的厚度在1.4至1.7 nm之间,相对于RHE为1.4至1.7 nm,具有随电位增加而变厚的趋势。恒定电位下的阴极还原会导致氧化膜变为折射率nf = 1.7的氧化膜,在还原30 s的初始阶段,膜的增厚约30%。在随后的阶段中,具有较低折射率的氧化物的厚度逐渐减小。从钝化区到阴极氢放出区的电势变化可能最初引起NiO的钝化氧化物水合,即NiO + H2O = Ni(OH)2,在还原的后期,水合的氧化镍逐渐溶解。

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